JPS63144580A - 電界効果トランジスタ - Google Patents

電界効果トランジスタ

Info

Publication number
JPS63144580A
JPS63144580A JP61293853A JP29385386A JPS63144580A JP S63144580 A JPS63144580 A JP S63144580A JP 61293853 A JP61293853 A JP 61293853A JP 29385386 A JP29385386 A JP 29385386A JP S63144580 A JPS63144580 A JP S63144580A
Authority
JP
Japan
Prior art keywords
inp
active layer
effect transistor
layer
field effect
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP61293853A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0261149B2 (en]
Inventor
Takemoto Kasahara
健資 笠原
Tomohiro Ito
伊東　朋弘
Keiichi Ohata
恵一 大畑
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP61293853A priority Critical patent/JPS63144580A/ja
Priority to DE8787118245T priority patent/DE3781389T2/de
Priority to US07/130,575 priority patent/US4837605A/en
Priority to EP87118245A priority patent/EP0271080B1/en
Publication of JPS63144580A publication Critical patent/JPS63144580A/ja
Publication of JPH0261149B2 publication Critical patent/JPH0261149B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00—Electrodes of devices having potential barriers
    • H10D64/60—Electrodes characterised by their materials
    • H10D64/602—Heterojunction gate electrodes for FETs
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/80—FETs having rectifying junction gate electrodes
    • H10D30/801—FETs having heterojunction gate electrodes

Landscapes

  • Junction Field-Effect Transistors (AREA)
JP61293853A 1986-12-09 1986-12-09 電界効果トランジスタ Granted JPS63144580A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP61293853A JPS63144580A (ja) 1986-12-09 1986-12-09 電界効果トランジスタ
DE8787118245T DE3781389T2 (de) 1986-12-09 1987-12-09 Indium-phosphide feldeffekttransistor mit hetero-mis-gate.
US07/130,575 US4837605A (en) 1986-12-09 1987-12-09 Indium-phosphide hetero-MIS-gate field effect transistor
EP87118245A EP0271080B1 (en) 1986-12-09 1987-12-09 Indium-phosphide hetero-mis-gate field effect transistor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61293853A JPS63144580A (ja) 1986-12-09 1986-12-09 電界効果トランジスタ

Publications (2)

Publication Number Publication Date
JPS63144580A true JPS63144580A (ja) 1988-06-16
JPH0261149B2 JPH0261149B2 (en]) 1990-12-19

Family

ID=17800002

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61293853A Granted JPS63144580A (ja) 1986-12-09 1986-12-09 電界効果トランジスタ

Country Status (4)

Country Link
US (1) US4837605A (en])
EP (1) EP0271080B1 (en])
JP (1) JPS63144580A (en])
DE (1) DE3781389T2 (en])

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH031547A (ja) * 1989-05-29 1991-01-08 Mitsubishi Electric Corp 化合物半導体ｍｉｓ・ｆｅｔおよびその製造方法
JP2008527302A (ja) * 2005-01-14 2008-07-24 エレクトロラックス ホーム プロダクツ コーポレイション ナームロゼ フェンノートシャップ モジュラー型冷蔵ユニット及びモジュラー型冷蔵ユニットを冷蔵機器のキャビネットに組み立てる方法

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6900481B2 (en) * 2002-02-21 2005-05-31 Intel Corporation Non-silicon semiconductor and high-k gate dielectric metal oxide semiconductor field effect transistors
KR102425892B1 (ko) 2020-09-09 2022-07-26 연세대학교 산학협력단 인듐과 인을 포함하는 층상구조 화합물, 나노시트 및 이를 이용한 전기 소자

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4117504A (en) * 1976-08-06 1978-09-26 Vadim Nikolaevich Maslov Heterogeneous semiconductor structure with composition gradient and method for producing same
US4160261A (en) * 1978-01-13 1979-07-03 Bell Telephone Laboratories, Incorporated Mis heterojunction structures
US4757358A (en) * 1982-03-12 1988-07-12 International Business Machines Corporation MESFET semiconductor device fabrication with same metal contacting source, drain and gate regions
US4745447A (en) * 1985-06-14 1988-05-17 American Telephone And Telegraph Company, At&T Bell Laboratories Gallium arsenide on gallium indium arsenide Schottky barrier device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH031547A (ja) * 1989-05-29 1991-01-08 Mitsubishi Electric Corp 化合物半導体ｍｉｓ・ｆｅｔおよびその製造方法
JP2008527302A (ja) * 2005-01-14 2008-07-24 エレクトロラックス ホーム プロダクツ コーポレイション ナームロゼ フェンノートシャップ モジュラー型冷蔵ユニット及びモジュラー型冷蔵ユニットを冷蔵機器のキャビネットに組み立てる方法

Also Published As

Publication number Publication date
EP0271080A3 (en) 1990-03-14
US4837605A (en) 1989-06-06
DE3781389T2 (de) 1993-03-18
JPH0261149B2 (en]) 1990-12-19
DE3781389D1 (de) 1992-10-01
EP0271080B1 (en) 1992-08-26
EP0271080A2 (en) 1988-06-15

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